Chamber components with increased pyrometry visibility

Coating apparatus – With indicating – testing – inspecting – or measuring means

Reexamination Certificate

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C702S030000, C702S087000, C702S130000

Reexamination Certificate

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07921803

ABSTRACT:
The present invention generally provides method and apparatus for non-contact temperature measurement in a semiconductor processing chamber. Particularly, the present invention provides methods and apparatus for non-contact temperature measurement for temperature below 500° C. One embodiment of the present invention provides an apparatus for processing semiconductor substrates. The apparatus comprises a target component comprises a material with higher emissivity than the one or more substrates.

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