Coating apparatus – With indicating – testing – inspecting – or measuring means
Reexamination Certificate
2011-04-12
2011-04-12
Hassanzadeh, Parviz (Department: 1716)
Coating apparatus
With indicating, testing, inspecting, or measuring means
C702S030000, C702S087000, C702S130000
Reexamination Certificate
active
07921803
ABSTRACT:
The present invention generally provides method and apparatus for non-contact temperature measurement in a semiconductor processing chamber. Particularly, the present invention provides methods and apparatus for non-contact temperature measurement for temperature below 500° C. One embodiment of the present invention provides an apparatus for processing semiconductor substrates. The apparatus comprises a target component comprises a material with higher emissivity than the one or more substrates.
REFERENCES:
patent: 3549847 (1970-12-01), Brown et al.
patent: 4611930 (1986-09-01), Stein
patent: 4891499 (1990-01-01), Moslehi
patent: 4984902 (1991-01-01), Crowley et al.
patent: 5308161 (1994-05-01), Stein
patent: 6228174 (2001-05-01), Takahashi
patent: 6280183 (2001-08-01), Mayur et al.
patent: 6753506 (2004-06-01), Liu et al.
patent: 7023229 (2006-04-01), Maesaki et al.
patent: 2003/0036877 (2003-02-01), Schietinger
patent: 2003/0049372 (2003-03-01), Cook et al.
patent: 2004/0058155 (2004-03-01), Windischmann
patent: 2005/0102108 (2005-05-01), Ramachandran et al.
patent: 2007/0084406 (2007-04-01), Yudovsky et al.
patent: 2008/0035632 (2008-02-01), Fujita et al.
Bourdo, S. E., Viswanathan T., Carbon 43 (2005) 2983-2988.
Modine, F. A., et al, Phys. Rev. B. 1984, 29, 836-841.
Song, M-K; Rhee, S-W; Chemical Vapor Deposition 2008, 14, 334-338.
Jasper, “Novel Uses of a Silicon Carbide Susceptor for Rapid Thermal Processor.” Motorola Technical Developments, vol. 23, Oct. 1994, pp. 129-133.
Griffin Kevin
Huang Yi-Chiau
Jallepally Ravi
Mahajani Maitreyee
McDougall Brendan
Applied Materials Inc.
Hassanzadeh Parviz
Hilton Albert
Patterson & Sheridan LLP
LandOfFree
Chamber components with increased pyrometry visibility does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Chamber components with increased pyrometry visibility, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chamber components with increased pyrometry visibility will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2655171