Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1997-09-29
1999-03-09
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429831, 20429806, 20429814, 156345, 118715, 118720, C23C 1434, C23C 1604
Patent
active
058795235
ABSTRACT:
A insulating part for use in a plasma reactor, particularly as a support for an electrically floating shield in a plasma sputtering reactor. The insulating part is composed of a metallic base and a partial surface covering of a ceramic insulator, such as alumina. Preferably the ceramic coating is deposited by thermal spraying. The insulating part can be easily affixed to other metal parts in the chamber by use of fastening means such as screws applied to the uncoated portions of the part. When the insulating part is used as an isolator to support but electrically isolate a second metal part, the second metal part may rest on the ceramic coating with the insulating part screwed to the chamber wall or other metal support member.
REFERENCES:
patent: 4419201 (1983-12-01), Levinstein et al.
Lech Pawlowski, The Science and Engineering of Thermal Spray Coating, 1995, pp. 28-52.
Ding Peijun
Wang Hougong
Applied Materials Inc.
Guenzer Charles S.
McDonald Rodney G.
Nguyen Nam
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