4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Hougong Wang

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Central coil design for ionized metal plasma deposition

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent

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Ceramic coated metallic insulator particularly useful in a plasm

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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Method and apparatus for processing substrates in a system...

Heating – Processes of heating or heater operation – Including preparing or arranging work for heating
Reexamination Certificate

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Method and apparatus for reducing the first wafer effect

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent

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Method and apparatus for reducing the first wafer effect

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1387634

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