Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Patent
1997-04-18
2000-05-16
Bowers, Charles
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
438238, 438197, 438253, 438255, 438694, 438700, 438734, 438396, 438398, 257306, H01L 2100
Patent
active
060636564
ABSTRACT:
A masking and etching technique during the formation of a memory cell capacitor which utilizes an etching technique to utilize a maximum surface area over the memory cell and to form thin spacers to pattern separation walls between capacitors. This technique results in efficient space utilization which, in turn, results in an increase in the surface area of the capacitor for an increased memory cell capacitance.
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Bowers Charles
Micro)n Technology, Inc.
Pert Evan
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