Cell capacitors, memory cells, memory arrays, and method of fabr

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

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438238, 438197, 438253, 438255, 438694, 438700, 438734, 438396, 438398, 257306, H01L 2100

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active

060636564

ABSTRACT:
A masking and etching technique during the formation of a memory cell capacitor which utilizes an etching technique to utilize a maximum surface area over the memory cell and to form thin spacers to pattern separation walls between capacitors. This technique results in efficient space utilization which, in turn, results in an increase in the surface area of the capacitor for an increased memory cell capacitance.

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