Carousel wafer transfer system

Details Carousel wafer transfer system Carousel wafer transfer system

1997-06-04

1999-09-14

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

Multizone chamber

118724, 20429825, 20429835, 414217, 414222, 414223, 414225, 414331, 414332, 414403, 414564, 414749, 414805, 414806, 414935, 414937, 414939, 414941, C23C 1600

Patent

active

059517700

ABSTRACT:
The present invention generally provides a rotary wafer carousel and related wafer handler for moving wafers or other workpieces through a processing system, i.e., a semiconductor fabrication tool. Generally, the present invention includes a rotary wafer carousel having a plurality of wafer seats disposed thereon to support one or more wafers. The rotary carousel is preferably disposed through the lid in a transfer chamber opposite the robot which is preferably disposed through the bottom of the transfer chamber. The rotary carousel and the robot cooperate to locate wafers adjacent to process chambers and move wafers into and out of various chambers of the system. The invention improves the throughput of the system by positioning wafers adjacent to the appropriate chamber to reduce the amount of movement required of the robot for transporting wafers between chambers.

REFERENCES:
patent: 4944650 (1990-07-01), Matsumoto
patent: 4951601 (1990-07-01), Maydan et al.
patent: 4971512 (1990-11-01), Lee et al.
patent: 5091217 (1992-02-01), Hay et al.
patent: 5133635 (1992-07-01), Malin et al.
patent: 5302209 (1994-04-01), Maeda et al.

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