Capacitive coupling plasma processing apparatus

Details Capacitive coupling plasma processing apparatus Capacitive coupling plasma processing apparatus

2006-03-30

2011-12-06

Gramaglia, Maureen (Department: 1716)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

Having glow discharge electrode gas energizing means

C118S7230ER

Reexamination Certificate

active

08070911

ABSTRACT:
A capacitive coupling plasma processing apparatus includes a process chamber configured to have a vacuum atmosphere, and a process gas supply section configured to supply a process gas into the chamber. In the chamber, a first electrode and a second electrode are disposed opposite each other. The second electrode includes a plurality of conductive segments separated from each other and facing the first electrode. An RF power supply is configured to apply an RF power to the first electrode to form an RF electric field within a plasma generation region between the first and second electrodes, so as to turn the process gas into plasma by the RF electric field. A DC power supply is configured to apply a DC voltage to at least one of the segments of the second electrode.

REFERENCES:
patent: 5151845 (1992-09-01), Watanabe et al.
patent: 5609690 (1997-03-01), Watanabe et al.
patent: 5708250 (1998-01-01), Benjamin et al.
patent: 5733511 (1998-03-01), De Francesco
patent: 5919332 (1999-07-01), Koshiishi et al.
patent: 6000360 (1999-12-01), Koshimizu
patent: 6110287 (2000-08-01), Arai et al.
patent: 6624084 (2003-09-01), Maeda et al.
patent: 6806652 (2004-10-01), Chistyakov
patent: 2001/0050144 (2001-12-01), Nishikawa et al.
patent: 2003/0086840 (2003-05-01), Himori et al.
patent: 2003/0141017 (2003-07-01), Fujisato
patent: 2004/0074604 (2004-04-01), Ichiki et al.
patent: 2005-72347 (2005-03-01), None
patent: WO0278040 (2002-03-01), None

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