Beam source and beam processing apparatus

Details Beam source and beam processing apparatus Beam source and beam processing apparatus

2006-04-25

2006-04-25

Wells, Nikita (Department: 2881)

Radiant energy

Electrically neutral molecular or atomic beam devices and...

C315S111510, C315S111810

Reexamination Certificate

active

07034285

ABSTRACT:
A beam source has a plasma generating chamber and a gas inlet port for introducing a gas into the plasma generating chamber. The beam source includes a plasma generator for generating positive-negative ion plasma containing positive ions at a density of at least 1010ions/cm3and negative ions from the gas. The beam source also includes a plasma potential adjustment electrode disposed in the plasma generating chamber and a grid electrode having a plurality of beam extraction holes formed therein. The beam extraction holes have a diameter of at least 0.5 mm. The beam source has a first power supply for applying a voltage of at most 500 V between the plasma potential adjustment electrode and the grid electrode.

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