Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate
2006-07-18
2006-07-18
Vo, Tuyet (Department: 2821)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
C315S111310, C315S111810, C118S7230IR
Reexamination Certificate
active
07078862
ABSTRACT:
A beam source has a plasma generating chamber, an antenna for generating plasma in the plasma generating chamber, a first electrode disposed in the plasma generating chamber, and a second electrode disposed in the plasma generating chamber. Both of the antenna and the second electrode face the first electrode. The beam source also includes a power supply for applying a voltage between the first electrode and the second electrode to extract particles from the plasma generated by the antenna. The beam source applies various kinds of beams having a large diameter, such as a positive ion beam, a negative ion beam, and a neutral particle beam, uniformly to a workpiece.
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Fukuda Akira
Hiyama Hirokuni
Ichiki Katsunori
Samukawa Seiji
Shibata Akio
Alemu Ephrem
Ebara Corporation
Tohoku University
Vo Tuyet
Westerman, Hattori, Daniels & Adrian , LLP.
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