Beam processing apparatus

Details Beam processing apparatus Beam processing apparatus

2005-02-01

2005-02-01

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C118S7230MR, C156S345420, C315S111210

Reexamination Certificate

active

06849857

ABSTRACT:
A beam processing apparatus comprises a workpiece holder (20) for holding a workpiece (X), a plasma generator for generating a plasma in a vacuum chamber (3), first electrode (4) disposed in the vacuum chamber (3), and a second electrode (5) disposed upstream of the first electrode (4) in the vacuum chamber (3). The beam processing apparatus further comprises a voltage applying unit for applying a variable voltage between the first electrode (4) and the second electrode (5) to alternately extract positive ions (6) and negative ions from the plasma generated by the plasma generator.

REFERENCES:
patent: 4987346 (1991-01-01), Katzschner et al.
patent: 5279669 (1994-01-01), Lee
patent: 5818040 (1998-10-01), Kinoshita et al.
patent: 6051151 (2000-04-01), Keller et al.
patent: 1 220 272 (2002-07-01), None
patent: 1 220 272 (2002-07-01), None
patent: 2 349 506 (2000-11-01), None
patent: WO 0106534 (2001-01-01), None
Walther, S, “Methods and Apparatus for Plasma Doping and Ion implantation in an Integrated Processing System”, Publication No: US 2003/0082891 A1, published May 1, 2003.*
European Patent Office, Patent Abstracts of Japan, Publication No. 57042131, dated Mar. 9, 1982. Cited in the int'l. search report.
European Patent Office, Patent Abstracts of Japan, Publication No. 2000100798, dated Apr. 7, 2000. Cited in the int'l. search report.
European Patent Office, Patent Abstracts of Japan, Publication No. 09162169, dated Jun. 20, 1997. Cited in the int'l. search report.

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