Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Post imaging radiant energy exposure
Patent
1997-05-01
1998-12-15
Nguyen, Nam
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Post imaging radiant energy exposure
430330, 427512, 427510, 427521, G03C 500
Patent
active
058495827
ABSTRACT:
A method and apparatus for curing a photoresist that is deposited in liquid form and spun on a surface of a wafer leaving a thin film to be cured. This invention teaches methods for curing the resist with improved thickness control using front side heating.
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Chen Chao-Chen
Chiu Wei-Kay
Ackerman Stephen B.
Nguyen Nam
Saile George O.
Taiwan Semiconductor Manufacturing Company , Ltd.
VerSteeg Steven H.
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