Backside contacts for MOS devices

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S758000

Reexamination Certificate

active

11475707

ABSTRACT:
A semiconductor structure includes a semiconductor substrate having a first surface and a second surface opposite the first surface, a gate dielectric over the first surface of the semiconductor substrate, a gate electrode over the gate dielectric, a source/drain region having at least a portion in the semiconductor substrate, a dielectric layer having a first surface and a second surface opposite the first surface wherein the first surface of the dielectric layer adjoins the second surface of the semiconductor substrate, and a contact plug in the dielectric layer, wherein the contact plug extends from a bottom side of the source/drain region to the second surface of the dielectric layer.

REFERENCES:
patent: 6407427 (2002-06-01), Oh
patent: 6483147 (2002-11-01), Lin
patent: 6921961 (2005-07-01), Sanchez et al.
patent: 6958285 (2005-10-01), Siniaguine
patent: 6979651 (2005-12-01), Hellig et al.
patent: 7005380 (2006-02-01), Aminpur et al.
patent: 2003/0203546 (2003-10-01), Burbach et al.
patent: 2005/0253175 (2005-11-01), Taddiken
patent: 2007/0267698 (2007-11-01), Bernstein et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Backside contacts for MOS devices does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Backside contacts for MOS devices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Backside contacts for MOS devices will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3945773

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.