Autofocus for high power laser diode based annealing system

Details Autofocus for high power laser diode based annealing system Autofocus for high power laser diode based annealing system

2011-03-22

2011-03-22

Le, Thao X (Department: 2892)

Semiconductor device manufacturing: process

Radiation or energy treatment modifying properties of...

C438S473000

Reexamination Certificate

active

07910499

ABSTRACT:
Apparatus for thermally processing a substrate includes a source of laser radiation comprising a plurality diode lasers arranged along a slow axis, optics directing the laser radiation from the source to the substrate, and an array of photodetectors arranged along a fast axis perpendicular to the slow axis and receiving portions of the laser radiation reflected from the substrate through the optics.

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Official Action Dated Dec. 31, 2009 Issued in Co-Pending U.S. Appl. No. 12/283,615.
Official Action Dated Apr. 7, 2010 Issued in Co-Pending U.S. Appl. No. 12/075,798.
Official Action Dated Sep. 15, 2010 Issued in Co-Pending U.S. Appl. No. 12/075,798.

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