Coating apparatus – Gas or vapor deposition – Multizone chamber
Reexamination Certificate
2005-01-11
2005-01-11
Hassanzdeh, Parviz (Department: 1763)
Coating apparatus
Gas or vapor deposition
Multizone chamber
C156S345310, C156S345320, C204S298250, C414S939000
Reexamination Certificate
active
06841006
ABSTRACT:
A substrate processing apparatus is disclosed. In one embodiment, the apparatus includes a first atmospheric deposition station and a second atmospheric deposition station. The second atmospheric deposition station comprises an atmospheric pressure vapor deposition chamber. A substrate handling system is adapted to transfer substrates between the first and the second atmospheric deposition stations.
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Barnes Michael
Cox Michael S.
Lai Canfeng
Parks John
Applied Materials Inc.
Hassanzdeh Parviz
Moore Karla
Townsend & Townsend & Crew
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