Arc chamber for ion implanter

Details Arc chamber for ion implanter Arc chamber for ion implanter

1996-10-25

1999-04-06

Anderson, Bruce

Radiant energy

Ion generation

Arc type

250423R, 31511181, H01J 2700

Patent

active

058922326

ABSTRACT:
An arc chamber including a reaction chamber, a filament element used to generate electrons, a first power supply means set for providing power to the filament element, a second power supply means utilized for creating a potential to increase the ionization efficiency, a plurality of gas injected openings set to inject suitable gas into the reaction chamber and be ionized in a gaseous plasma by impact from electrons, a first filament insulator, and three second filament insulators used for isolation. The first filament insulator includes a truncated corn portion and a ring portion. The truncated corn portion has a hole formed threrethrough itself. The ring portion is coaxially connected to the smaller surface of the truncated corn portion. The second filament insulator includes a truncated corn portion and two ring portions. Similarily, the truncated corn portion has a hole through formed therethrough. The ring portions are respectively coaxially connected to the two surfaces of the truncated corn portion. In the preferred embodiment, three first filament insulators and one second filament insulator are set on the filament element for isolation. The filament insulators are screwed into the filament element and exactly attached on the side wall of the reaction chamber.

REFERENCES:
patent: 4954751 (1990-09-01), Kaufman et al.
patent: 5049784 (1991-09-01), Matsudo
patent: 5162699 (1992-11-01), Tokoro et al.
patent: 5252892 (1993-10-01), Koshitishi et al.
patent: 5256947 (1993-10-01), Toy et al.

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