Approach to improve ellipsometer modeling accuracy for...

Details Approach to improve ellipsometer modeling accuracy for... Approach to improve ellipsometer modeling accuracy for...

2007-08-21

2007-08-21

Nguyen, Sang H (Department: 2886)

Optics: measuring and testing

By polarized light examination

Of surface reflection

C356S630000

Reexamination Certificate

active

10757204

ABSTRACT:
A method of determining optical constants n and k for a film on a substrate is described. Optical measurements are preferably performed with an integrated optical measurement system comprising a reflectometer, spectral ellipsometer, and broadband spectrometer such as an Opti-Probe series tool from Therma-Wave. A beam profile reflectometer is employed to first determine the thickness of said film from a best fit of modeling data to experimental data. The thickness data is combined with the ellipsometer and spectrometer measurements to produce an experimental data output which is fitted with modeled information to determine a best fit of the data. Constants n and k are derived from the best fit of data. The method provides a higher accuracy for n and k values than by standard procedures which calculate n, k, and t simultaneously. The method may also be applied to bilayer or multi-layer film stacks.

REFERENCES:
patent: 4826321 (1989-05-01), Coates et al.
patent: 5452091 (1995-09-01), Johnson
patent: 5798837 (1998-08-01), Aspnes et al.
patent: 6057928 (2000-05-01), Li et al.
patent: 6141103 (2000-10-01), Pinaton et al.
patent: 6151116 (2000-11-01), Hirosawa
patent: 6304326 (2001-10-01), Aspnes et al.
patent: 6411385 (2002-06-01), Aspnes et al.
patent: 6417921 (2002-07-01), Rosencwaig et al.
patent: 6583876 (2003-06-01), Opsal et al.
patent: 6646752 (2003-11-01), Chen et al.
patent: 6671047 (2003-12-01), Opsal et al.
patent: 6710889 (2004-03-01), Lee et al.

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