Apparatus for wafer level arc detection at an RF bias...

Details Apparatus for wafer level arc detection at an RF bias... Apparatus for wafer level arc detection at an RF bias...

2007-08-15

2010-06-08

Dole, Timothy J (Department: 2831)

Electricity: measuring and testing

Fault detecting in electric circuits and of electric components

For fault location

C438S010000, C204S298030, C204S298080

Reexamination Certificate

active

07733095

ABSTRACT:
Wafer level arc detection is provided in a plasma reactor using an RF transient sensor coupled to a threshold comparator, and a system controller responsive to the threshold comparator.

REFERENCES:
patent: 4156472 (1979-05-01), Kunz
patent: 4737970 (1988-04-01), Viola et al.
patent: 5472561 (1995-12-01), Williams et al.
patent: 5847913 (1998-12-01), Turner et al.
patent: 5993615 (1999-11-01), Abry et al.
patent: 6190513 (2001-02-01), Forster et al.
patent: 6246567 (2001-06-01), Parkhe
patent: 6462481 (2002-10-01), Holland et al.
patent: 6736944 (2004-05-01), Buda
patent: 6840763 (2005-01-01), Sik
patent: 7475294 (2009-01-01), Maki et al.
patent: 7553679 (2009-06-01), Hoffman
patent: 2002/0125892 (2002-09-01), Parker et al.
patent: 2003/0082835 (2003-05-01), McChesney et al.
patent: 2004/0149384 (2004-08-01), Kanno et al.
patent: 2004/0182697 (2004-09-01), Buda
patent: 2005/0236266 (2005-10-01), Poole et al.
patent: 2005/0236377 (2005-10-01), Hoffman et al.
patent: 2006/0049831 (2006-03-01), Anwar et al.
patent: 2006/0081564 (2006-04-01), Moroz et al.
patent: 2006/0196421 (2006-09-01), Ronsse et al.
patent: 2006/0213761 (2006-09-01), Axenbeck et al.
patent: 2007/0019360 (2007-01-01), Huang et al.
patent: 2008/0067081 (2008-03-01), Chou et al.
patent: 2006/237009 (2006-09-01), None
U.S. Appl. No. 11/893,352, filed Aug. 15, 2007, Piptone et al.
U.S. Appl. No. 11/893,354, filed Aug. 15, 2007, Pipitone et al.
U.S. Appl. No. 11/893,355, filed Aug. 15, 2007, Pipitone et al.
U.S. Appl. No. 11/893,390, filed Aug. 15, 2007, Pipitone et al.
Official Communication Dated Sep. 8, 2009 in Co-Pending U.S. Appl. No. 11/893,390.
Official Communication Dated Sep. 23, 2009 in Co-Pending U.S. Appl. No. 11/893,354.
Official Communication Dated Sep. 23, 2009 in Co-Pending U.S. Appl. No. 11/893,355.
Official Communication Dated Sep. 23, 2009 in Co-Pending U.S. Appl. No. 11/893,352.

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