Coating apparatus – Gas or vapor deposition – Work support
Patent
1995-11-29
1998-09-22
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
Work support
414936, 414937, 414939, 414941, 901 30, 901 39, 118500, 156345, C23C 1600, B65G 4907
Patent
active
058109358
ABSTRACT:
An apparatus for transferring a wafer in a semiconductor manufacturing process, and for carrying a wafer between a cassette and a wafer chuck without an additional tool such as a tripod. The apparatus includes: a holder capable of holding the side of the wafer; a wafer transfer assembly including an actuator of the holder and a detector that detects a malfunction of the holder; and a process reactor having a vacuum exhaust port installed under a wafer chuck so as to guide gas in an axially-symmetric flow pattern. The holder grasps the rounded side of a wafer. Removal of additional tools makes the structure of an overall system more simple and an exhaust port can be installed under the reactor so as to cause processing gas to be guided in an axially-symmetric flow, resulting in an enhancement of the process uniformity.
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New Challenges for Robotics and Automation, Solid State Technology pp. 67-69, Apr. 1994.
Choi Boo-Yeon
Jang Ki-Ho
Jang Won-Ick
Lee Jong-Hyun
Yoo Hyung-Joun
Breneman R. Bruce
Electronics and Telecommunications Research Institute
Lund Jeffrie R.
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