Apparatus for the stabilization of halogen-doped films through t

Details Apparatus for the stabilization of halogen-doped films through t Apparatus for the stabilization of halogen-doped films through t

1997-04-24

2000-06-06

Breneman, Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118723I, 156345, 4273762, C23C 1600

Patent

active

060705507

ABSTRACT:
A method and apparatus for depositing a halogen-doped oxide film having a low dielectric constant that is resistant to moisture absorption and outgassing of the halogen dopant, and that retains these qualities despite subsequent processing steps. The method begins by introducing process gases (including a halogen-containing source gas) into a processing chamber. A halogen-doped layer is then deposited. The combination of process gases is then changed and a sealing layer deposited which seals the dopant into the halogen-doped layer. The sealing layer may, for example, be a carbon-rich layer or an undoped layer. These steps are repeated until the film reaches a selected thickness.

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