Apparatus for spraying photoresist

Details Apparatus for spraying photoresist Apparatus for spraying photoresist

1997-03-19

1998-09-29

Edwards, Laura

Coating apparatus

Projection or spray type

118600, 118685, 222394, 137209, B05B 700, B05C 1100, B65D 8300

Patent

active

058141510

ABSTRACT:
A photoresist spraying apparatus for coating a photoresist with pressure from a nitrogen gas includes a tank which has a photoresist holding portion and an air portion. A photoresist inflow conduit is connected to a sidewall of the tank to intake photoresist and a photoresist outflow conduit is connected to a bottom of the tank for discharging photoresist. A T-shaped gas conduit has a gas inlet, a gas outlet and a connecting portion therebetween for connecting to the tank. The flow of a gas from the gas inlet to the gas outlet lowers the air pressure inside the tank so that air and bubbles remaining inside the tank are discharged to the gas outlet via the connecting portion, while a photoresist flows into the tank via the photoresist inflow conduit. A valve, provided in the gas outlet of the gas conduit, opens and closes to fill and discharge photoresist in the tank according to the pressure inside the tank. Therefore, the gas flows in the gas conduit responsive to whether the valve is open or closed, and bubbles included in the photoresist inside the tank are easily removed, thereby enhancing the quality of the photoresist coating.

REFERENCES:
patent: 4235829 (1980-11-01), Partus
patent: 4676404 (1987-06-01), Yamazaki et al.
patent: 5458895 (1995-10-01), Petronini et al.
patent: 5568882 (1996-10-01), Takacs

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