Apparatus for retaining a subtrate in a semiconductor wafer proc

Details Apparatus for retaining a subtrate in a semiconductor wafer proc Apparatus for retaining a subtrate in a semiconductor wafer proc

1998-04-21

2000-08-15

Leja, Ronald W.

Electricity: electrical systems and devices

Electric charge generating or conducting means

Use of forces of electric charge or field

279128, H02N 1300

Patent

active

061045969

ABSTRACT:
An electrostatic chuck including a body of ceramic and a metal backing portion for mounting the chuck directly to a metal pedestal and a process of manufacturing the electrostatic chuck using sintering. The electrostatic chuck contains a metal backing portion having at least one hole extending therethrough and the body of ceramic includes at least one portion extending through the hole.

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