Radiant energy – With charged particle beam deflection or focussing – With detector
Patent
1996-05-28
1998-09-01
Anderson, Bruce
Radiant energy
With charged particle beam deflection or focussing
With detector
25049221, H01J 37244
Patent
active
058013865
ABSTRACT:
Apparatus for measuring plasma characteristics within a semiconductor wafer processing system and a method of fabricating and using the apparatus. The apparatus contains a first insulator layer upon which one or more conductive collector pads are formed by patterning and etching a copper laminate. Each collector pad is connected to a conductive lead (e.g., a printed circuit trace) that extends from each collector pad to the edge of the first insulator layer. A second insulator layer is positioned above the first insulator layer such that the collector pad(s) and their respective lead(s) are sandwiched between the two insulator layers. An adhesive is used to affix the second insulator to the first insulator and the collector pads. The collector pads are exposed to the plasma through apertures defined by the second insulator layer.
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Loewenhardt Peter
Pan Shaoher X.
Podlesnik Dragan
Qian Xue-Yu
Sato Arthur H.
Anderson Bruce
Applied Materials Inc.
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