Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Patent
1998-05-01
2000-06-27
Fleming, Fritz
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
279128, H02N 1300
Patent
active
060814144
ABSTRACT:
Apparatus for biasing and retaining a wafer in a semiconductor wafer processing system. The apparatus has a pedestal, a puck and an electrode disposed between the pedestal and the puck. The pedestal defines an enclosure within which the electrode and other pedestal components are housed. The electrode may serve as a cooling plate for the puck. Each of the components is insulated so as to define an electrical path. The electrical path consists of a conductor connected to a coolant tube inside the enclosure and the cooling plate which is in contact with the coolant tube. The cooling plate is electrically isolated from the pedestal via an isolator ring that circumscribes an upper inner wall of the enclosure. The coolant tube is disposed in a channel on the bottomside of the cooling plate and affixed to the plate so as to establish physical contact. The coolant tube and plate conduct RF power from a power source connected to the tube. The power then capacitively couples through the electrostatic chuck to bias a wafer retained thereon. The cooling plate also provides for temperature control of the wafer via a plurality of grooves on the top surface of the plate.
REFERENCES:
patent: 5147497 (1992-09-01), Nozawa et al.
patent: 5155652 (1992-10-01), Logan et al.
patent: 5191506 (1993-03-01), Logan et al.
patent: 5228501 (1993-07-01), Tepman et al.
patent: 5250137 (1993-10-01), Arami et al.
patent: 5310453 (1994-05-01), Fukasawa et al.
patent: 5376213 (1994-12-01), Ueda et al.
patent: 5463526 (1995-10-01), Mundt
patent: 5567267 (1996-10-01), Kazama et al.
patent: 5571366 (1996-11-01), Ishii et al.
patent: 5581874 (1996-12-01), Aoki et al.
patent: 5584971 (1996-12-01), Komino
patent: 5625526 (1997-04-01), Watanabe et al.
patent: 5656093 (1997-08-01), Burkhart et al.
Flanigan Allen
Sugarman Michael N.
Applied Materials Inc.
Fleming Fritz
LandOfFree
Apparatus for improved biasing and retaining of a workpiece in a does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for improved biasing and retaining of a workpiece in a, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for improved biasing and retaining of a workpiece in a will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1789403