Apparatus for detection of surface contaminations on silicon waf

Details Apparatus for detection of surface contaminations on silicon waf Apparatus for detection of surface contaminations on silicon waf

1996-04-12

1997-11-18

Nguyen, Kiet T.

Radiant energy

Inspection of solids or liquids by charged particles

Positive ion probe or microscope type

250297, H01J 4944

Patent

active

056891121

ABSTRACT:
Surface contamination of silicon wafers is detected by a combined beam-deflecting magnet and magnetic spectrometer system. Heavy ions are directed onto the surface of a silicon wafer through the beam-deflecting magnet, and ions back-scattered from contaminants in the surface of the wafer pass through the magnetic spectrometer onto a focal-plane detector. One or more Einzel lenses prevent ions back-scattered from the silicon in the wafer from reaching the detector.

REFERENCES:
patent: 3213276 (1965-10-01), Enge
patent: 3778626 (1973-12-01), Robertson
patent: 4234797 (1980-11-01), Ryding
patent: 4829179 (1989-05-01), Aoki et al.
patent: 4864130 (1989-09-01), Gruen et al.
patent: 5059785 (1991-10-01), Doyle et al.
patent: 5166521 (1992-11-01), Hayashi et al.
patent: 5495110 (1996-02-01), Ohnishi et al.
Nuclear Instruments and Methods in Physics Research B 118 (1996) pp. 782-786 "In-Situ Rutherford backscattering design for early SIMOX-SOI" Allen et al.

Affiliated with

Also associated with

Rating

Apparatus for detection of surface contaminations on silicon waf does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for detection of surface contaminations on silicon waf, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for detection of surface contaminations on silicon waf will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1567999