Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2007-02-13
2007-02-13
Zervigon, Rudy (Department: 1763)
Coating apparatus
Gas or vapor deposition
C156S345290, C118S7230AN
Reexamination Certificate
active
10352257
ABSTRACT:
An apparatus for cyclical depositing of thin films on semiconductor substrates, comprising a process chamber having a gas distribution system with separate paths for process gases and an exhaust system synchronized with operation of valves dosing the process gases into a reaction region of the chamber.
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Al-Shaikh Ayad A.
Gelatos Avgerinos V.
Glenn Walter Benjamin
Khan Ahmad A.
Mak Alfred W.
Applied Materials Inc.
Patterson & Sheridan LLP
Zervigon Rudy
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