Apparatus for cyclical deposition of thin films

Coating apparatus – Gas or vapor deposition

Reexamination Certificate

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C156S345290, C118S7230AN

Reexamination Certificate

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10352257

ABSTRACT:
An apparatus for cyclical depositing of thin films on semiconductor substrates, comprising a process chamber having a gas distribution system with separate paths for process gases and an exhaust system synchronized with operation of valves dosing the process gases into a reaction region of the chamber.

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