Apparatus and process for automatically measuring aperture size

Optics: measuring and testing – By configuration comparison – With photosensitive film or plate

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356394, 356400, G01B 1102

Patent

active

045332517

ABSTRACT:
Apparatus for automatically measuring aperture size of apertured material includes a means for supporting and transporting the apertured material and a light source providing a light beam directed for passage through the apertured material to a light detector and is characterized by a comparator mask of alternate light transparent and opaque sectors of a given dimension and means for overlaying the apertured material with the comparator mask to provide a given length of light transparent slot and responsive to signals representing light transmitted through the given length of slot for deriving a signal representing the width of the slots of the slotted material. Also, a process for automatically measuring aperture size includes the steps of overlaying the slotted material with the comparator mask and utilizing a signal from the light detector representing light transmission of the slots of a given length to derive a signal representative of the slot width.

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patent: 3554630 (1971-01-01), Rogers, Jr.
patent: 3906239 (1975-09-01), Smith et al.
patent: 3989386 (1976-11-01), Smith
patent: 4153371 (1979-05-01), Koizumi et al.
patent: 4172553 (1979-10-01), Feather et al.
Ragland, Jr., F. R., "Method of Measuring the Width of Apertures in a PI Shadow Mask", RCA Tech. Notes, TN No. 1231, mailed 9-6-79.
Balmer et al., "Novel Electro-Optical Techniques in Metrology", Electronics & Power, vol. 22, 1-1976, pp. 27-30.

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