Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent
1980-06-09
1985-08-06
Punter, William H.
Optics: measuring and testing
By configuration comparison
With photosensitive film or plate
356394, 356400, G01B 1102
Patent
active
045332517
ABSTRACT:
Apparatus for automatically measuring aperture size of apertured material includes a means for supporting and transporting the apertured material and a light source providing a light beam directed for passage through the apertured material to a light detector and is characterized by a comparator mask of alternate light transparent and opaque sectors of a given dimension and means for overlaying the apertured material with the comparator mask to provide a given length of light transparent slot and responsive to signals representing light transmitted through the given length of slot for deriving a signal representing the width of the slots of the slotted material. Also, a process for automatically measuring aperture size includes the steps of overlaying the slotted material with the comparator mask and utilizing a signal from the light detector representing light transmission of the slots of a given length to derive a signal representative of the slot width.
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Ragland, Jr., F. R., "Method of Measuring the Width of Apertures in a PI Shadow Mask", RCA Tech. Notes, TN No. 1231, mailed 9-6-79.
Balmer et al., "Novel Electro-Optical Techniques in Metrology", Electronics & Power, vol. 22, 1-1976, pp. 27-30.
French Kenneth
Kocher Robert C.
Piorkow Alfred
Shaner Kenneth
Smith J. Thomas
Buffton Thomas H.
GTE Products Corporation
Punter William H.
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