Apparatus and method to confine plasma and reduce flow...

Details Apparatus and method to confine plasma and reduce flow... Apparatus and method to confine plasma and reduce flow...

2011-07-05

2011-07-05

Gramaglia, Maureen (Department: 1716)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

C118S7230AN

Reexamination Certificate

active

07972467

ABSTRACT:
An apparatus configured to confine a plasma within a processing region in a plasma processing chamber. In one embodiment, the apparatus includes a ring that has a baffle having a plurality of slots and a plurality of fingers. Each slot is configured to have a width less than the thickness of a plasma sheath contained in the processing region.

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