Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2005-12-12
2009-12-08
Neckel, Alexa D (Department: 1795)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298010, C204S298160, C204S298200
Reexamination Certificate
active
07628899
ABSTRACT:
The present invention generally provides an apparatus and method for processing a surface of a substrate in a PVD chamber that has a magnetron assembly whose shape can be distorted to adjust the magnetic field strength in the processing region of the deposition chamber to improve the deposition uniformity. In general, aspects of the present invention can be used for flat panel display processing, semiconductor processing, solar cell processing, or any other substrate processing. In one aspect, the processing chamber contains one or more magnetron regions and magnetron actuators that are used to increase and more evenly distribute the magnetic field strength throughout the processing region of the processing chamber during processing.
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Sloan, Domestic Price List, Jul. 1, 1981, 1-68 pp..
Hosokawa Akihiro
Le Hien-Minh H.
White John M.
Applied Materials Inc.
Band Michael
Neckel Alexa D
Patterson & Sheridan LLP
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