Apparatus and method for regulating a pressure in a chamber

Details Apparatus and method for regulating a pressure in a chamber Apparatus and method for regulating a pressure in a chamber

1997-07-15

1999-08-31

Ferensic, Denise L.

Fluid handling

Line condition change responsive valves

Pilot or servo controlled

137 14, 137907, F16K 3112, F17D 116, E03B 2509

Patent

active

059440490

ABSTRACT:
A pressure for a chamber is regulated by controlling either the exhaust pressure at the exhaust side of a first vacuum pump or the internal pressure at a compression stage of the first vacuum pump, where the first vacuum pump is directly communicating with the chamber. The pressure of the chamber can be regulated by combinations of the following: controlling the variable rotational frequency of a roots vacuum pump, a pre-vacuum pump, or a high compression pump; controlling a control valve between a pre-vacuum pump and the first vacuum pump; controlling a control valve for injecting gas into the exhaust side of the first vacuum pump or into the compression stage of the first vacuum pump; and controlling a control valve or control valves for bypassing the first vacuum pump or a compression stage or compression stages of the first vacuum pump. To regulate the pressure in the chamber, several types of control rules can be used, including: a PID control rule, a gain scheduler, and a threshold comparison control rule.

REFERENCES:
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patent: 5039280 (1991-08-01), Saulgeot et al.
patent: 5340295 (1994-08-01), Preiato et al.
patent: 5433238 (1995-07-01), Cannizzaro et al.
patent: 5719609 (1998-02-01), Hauck et al.

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