Apparatus and method for measuring aerial image of EUV mask

Details Apparatus and method for measuring aerial image of EUV mask Apparatus and method for measuring aerial image of EUV mask

2010-03-02

2010-10-26

Nguyen, Sang (Department: 2886)

Optical: systems and elements

Diffraction

From zone plate

C359S576000, C359S859000, C378S034000, C250S492200, C356S607000, C356S639000

Reexamination Certificate

active

07821714

ABSTRACT:
An apparatus for measuring an image of a pattern to be formed on a semiconductor by scanning the pattern using a scanner, the apparatus including an EUV mask including the pattern, a zoneplate lens on a first side of the EUV mask and adapted to focus EUV light on a portion of the EUV mask at a same angle as an angle at which the scanner will be disposed with respect to a normal line of the EUV mask, and a detector arranged on another side of the EUV mask and adapted to sense energy of the EUV light from the EUV mask, wherein NAzoneplate=NAscanner
and NAdetector=NAscanner
*σ, where NAzoneplatedenotes a NA of the zoneplate lens, NAdetectordenotes a NA of the detector, and NAscannerdenotes a NA of the scanner, σ denotes an off-axis degree of the scanner, and n denotes a reduction magnification of the scanner.

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