4. Optical: systems and elements
  5. Diffraction
  6. From zone plate

Dong-gun Lee

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Apparatus and method for measuring aerial image of EUV mask

Optical: systems and elements – Diffraction – From zone plate
Reexamination Certificate

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Microscope and method of providing image data using the same

Optical: systems and elements – Compound lens system – Microscope
Reexamination Certificate

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Photomask, method of making a photomask and photolithography...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate

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Profile ID: LFUS-PAI-P-3277126

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