Antireflective coating films

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – At least one aryl ring which is part of a fused or bridged...

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524164, 524165, 524319, 524462, 524463, 524503, 524545, 524546, 430273, C08L 2712

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active

057445370

ABSTRACT:
Enhanced fidelity of pattern transfer of aqueous developable photoresist compositions is achieved with top antirefective coatings which are fluorine-containing and have a refractive index approximately equal to the square root of the underlying photoresist and which are removable in the developer for the photoresist.

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"J. Electrochem. Soc.", Tanaka et al., 137, 3900-05 1990, Tanaka I; A new Photo lithography technique w/ anti-reflective coating on resist.
"Reflectivity Measurement at the Interface between resist and substrate", T. Tanaka et al., Chem Abs, 107; 87208y (1987).
T. Tanaka, J. Electrochem Soc., 137; pp. 3900-3905 (1990) A new Photo lithography technique u/antireflective coating on Resist.
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