Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2006-07-04
2006-07-04
Mehta, Bhavesh M. (Department: 2625)
Image analysis
Applications
Manufacturing or product inspection
C382S149000, C356S237100
Reexamination Certificate
active
07072502
ABSTRACT:
A reticle inspection system and method for complete and fast inspection of phase shift mask reticles, both for incoming inspection and for periodic and pre-exposure inspection tool, is employable by facilities such as mask shops as an inspection tool compatible to the mask shop's customers. The inventive system and method detect phase errors in an aerial image by acquiring the image of the phase shift mask under the same optical conditions as the exposure conditions (i.e. wavelength, numerical aperture, sigma, and illumination aperture type). Images are acquired at a positive out-of-focus and a negative out-of-focus, and are compared in order to enhance possible phase error. The term “phase error” refers to the acceptable range of the phase deviation from the programmed 180° on the phase shift mask, by using the exposure system to achieve the image on the photoresist, satisfying the requirements of the wafer specification.
REFERENCES:
patent: 3725574 (1973-04-01), Gast
patent: 4148065 (1979-04-01), Nakagawa et al.
patent: 4595289 (1986-06-01), Feldman et al.
patent: 4922308 (1990-05-01), Noguchi et al.
patent: 4926489 (1990-05-01), Danielson et al.
patent: 5114223 (1992-05-01), Torigoe et al.
patent: 5210635 (1993-05-01), Nagata et al.
patent: 5272116 (1993-12-01), Hosono
patent: 5441834 (1995-08-01), Takekuma et al.
patent: 5481624 (1996-01-01), Kamon
patent: 5563702 (1996-10-01), Emery et al.
patent: 5572598 (1996-11-01), Wihl et al.
patent: 5576829 (1996-11-01), Shiraishi et al.
patent: 5744381 (1998-04-01), Tabata et al.
patent: 5745168 (1998-04-01), Ninomiya
patent: 5795688 (1998-08-01), Burdorf et al.
patent: 5838433 (1998-11-01), Hagiwara
patent: 5892579 (1999-04-01), Elyasaf et al.
patent: 5965306 (1999-10-01), Mansfield et al.
patent: 6016357 (2000-01-01), Neary et al.
patent: 6018392 (2000-01-01), Tzu et al.
patent: 6025905 (2000-02-01), Sussman
patent: 6052478 (2000-04-01), Wihl et al.
patent: 6072898 (2000-06-01), Beaty et al.
patent: 6075883 (2000-06-01), Stern et al.
patent: 6078393 (2000-06-01), Oohashi et al.
patent: 6078738 (2000-06-01), Garza et al.
patent: 6081659 (2000-06-01), Garza et al.
patent: 6091845 (2000-07-01), Pierrat et al.
patent: 6124924 (2000-09-01), Feldman et al.
patent: 6148097 (2000-11-01), Nakayama et al.
patent: 6268093 (2001-07-01), Kenan et al.
patent: 6327033 (2001-12-01), Ferguson et al.
patent: 6335129 (2002-01-01), Asano et al.
patent: 6466315 (2002-10-01), Karpol et al.
patent: 6580502 (2003-06-01), Kuwabara
patent: 2002/0171825 (2002-11-01), Krantz et al.
patent: 0 628 806 (1994-12-01), None
“Improving Resolution in Photolithography with a Phase Shifting Mask” by Marc D. Levenson et al. in IEEE Transactions on Electron Devices, vol. ED-29, No. 12, Dec. 1982.
Budd et al., “A New Mask Evaluation Tool, The Microlithography Simulation Microscope Aerial Image Measurement System,”Optical / Laser Microlithography 7, San Jose, Mar. 2-4, 1994, Proceedings of SPIE, Optical/Laser Microlithography, Bellingham, SPIE, US vol. 2197, pp. 530-540.
Martino et al., “Application of the Aerial Image Measurement System (AIMS) to the Analysis of Binary Mask Imaging and Resolution Enhancement Techniques,”Optical / Laser Microlithography 7, San Jose, Mar. 2-4, 1994, Proceedings of SPIE, Optical/Laser Microlithography, Bellingham, SPIE, US vol. 2197, pp. 573-584.
Ferguson, Richard A., et al., “Application of an Aerial Image Measurement System to Mask Fabrication and Analysis,”SPIE vol. 2087 13thAnnual Symposium on Photomask Technology and Management, Sep. 22-23, 1993, Santa Clara, California, pp. 131-144.
Budd, Russell A., et al., “A New Tool for Phase Shift Mask Evaluation, the Stepper Equivalent Aerial Image Measurement System—AIMS™,”SPIEvol. 2087 Photomask Technology and Management (1993).
Schenker, Richard, “Comparison of Single and Dual Exposure Phase Shift Mask Approaches for Poly Gate Patterning,”SPIE,vol. 3546, Sep. 1998.
Friedman Mula
Goldenshtein Alex
Greenberg Gadi
Hemar Shirley
Kenan Boaz
Applied Materials Inc.
Mehta Bhavesh M.
Strege John B.
Sughrue & Mion, PLLC
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