Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent
1991-10-01
1992-05-12
Evans, F. L.
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
2504911, 307119, 340686, G01B 1100
Patent
active
051121336
ABSTRACT:
An alignment system usable in an exposure apparatus for printing a pattern of a mask on a wafer, for aligning the mask and the wafer, is disclosed. The system includes a plurality of position detecting devices; a plurality of driving stages corresponding to the position detecting devices, respectively, each driving stage being adapted to move a corresponding one of the position detecting devices two-dimensionally along a plane which is substantially opposed to the mask; a plurality of contacts corresponding to the position detecting devices, respectively, each contact being provided at an end portion of a corresponding one of the position detecting devices, along the plane and facing the pattern side; a detecting device for detecting mutual approach of the position detecting devices through at least one of the contacts; and a control device for controlling movement of at least one of the driving stages in accordance with the detection by the detecting device.
Ebinuma Ryuichi
Kariya Takao
Kurosawa Hiroshi
Ozawa Kunitaka
Uda Koji
Canon Kabushiki Kaisha
Evans F. L.
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