4. X-ray or gamma ray systems or devices
  5. Specific application
  6. Lithography

Hiroshi Kurosawa

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Alignment apparatus, control method therefor, exposure...

Optics: measuring and testing – By light interference – For dimensional measurement
Reexamination Certificate

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Alignment apparatus, control method thereof, exposure...

Optics: measuring and testing – By alignment in lateral direction
Reexamination Certificate

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Alignment system

Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent

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Apparatus for measuring free and total sulfurous acid and method

Chemistry: molecular biology and microbiology – Measuring or testing process involving enzymes or... – Involving viable micro-organism
Patent

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Automatic focusing apparatus which removes light reflected by a

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems
Patent

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Profile ID: LFUS-PAI-P-366318

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