Alignment mark on a semiconductor and a method of forming the sa

Details Alignment mark on a semiconductor and a method of forming the sa Alignment mark on a semiconductor and a method of forming the sa

1985-01-17

1987-02-03

Kettle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430 22, 430324, 356401, G03C 500, G03F 900

Patent

active

046408886

ABSTRACT:
An alignment mark formed on a semiconductor wafer is disclosed. The mark comprises a mark member provided on a base region and a reflection changing portion provided on the mark member. The reflection changing portion has slightly inclined side walls.

REFERENCES:
patent: 3690881 (1972-09-01), King
patent: 4343878 (1982-08-01), Chiang

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