Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate
2006-05-31
2009-08-04
Kebede, Brook (Department: 2894)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Insulative material deposited upon semiconductive substrate
C257SE21006, C427S249190
Reexamination Certificate
active
07569500
ABSTRACT:
Methods of forming metal compounds such as metal oxides or metal nitrides by sequentially introducing and then reacting metal organic compounds with ozone one or with oxygen radicals or nitrogen radicals formed in a remote plasma chamber. The metal compounds have surprisingly and significantly improved uniformity when deposited by atomic layer deposition with cycle times of at least 10 seconds. The metal compounds also do not contain detectable carbon when the metal organic compound is vaporized at process conditions in the absence of solvents or excess ligands.
REFERENCES:
patent: 3427514 (1969-02-01), Olmstead et al.
patent: 3594295 (1971-07-01), Meckel et al.
patent: 4043848 (1977-08-01), Bazin
patent: 4096509 (1978-06-01), Blaha et al.
patent: 4262631 (1981-04-01), Kubacki
patent: 4310380 (1982-01-01), Flamm et al.
patent: 4335391 (1982-06-01), Morris
patent: 4412119 (1983-10-01), Komatsu et al.
patent: 4439463 (1984-03-01), Miller
patent: 4459739 (1984-07-01), Shepherd et al.
patent: 4495219 (1985-01-01), Kato et al.
patent: 4534826 (1985-08-01), Goth et al.
patent: 4545112 (1985-10-01), Holmberg et al.
patent: 4563367 (1986-01-01), Sherman
patent: 4585516 (1986-04-01), Corn et al.
patent: 4605947 (1986-08-01), Price et al.
patent: 4608063 (1986-08-01), Kurokawa
patent: 4651185 (1987-03-01), Holmberg et al.
patent: 4700458 (1987-10-01), Suzuki et al.
patent: 4725560 (1988-02-01), Abernathey et al.
patent: 4743953 (1988-05-01), Toyokura et al.
patent: 4745082 (1988-05-01), Kwok
patent: 4851370 (1989-07-01), Doklan et al.
patent: 4913929 (1990-04-01), Moslehi et al.
patent: 4948458 (1990-08-01), Ogle
patent: 4980307 (1990-12-01), Ito et al.
patent: 5000113 (1991-03-01), Wang et al.
patent: 5063431 (1991-11-01), Ohshima
patent: 5173442 (1992-12-01), Carey
patent: 5228950 (1993-07-01), Webb et al.
patent: 5290609 (1994-03-01), Horiike et al.
patent: 5292673 (1994-03-01), Shinriki et al.
patent: 5302236 (1994-04-01), Tahara et al.
patent: 5314724 (1994-05-01), Tsukune et al.
patent: 5335138 (1994-08-01), Sandhu et al.
patent: 5391510 (1995-02-01), Hsu et al.
patent: 5464783 (1995-11-01), Kim et al.
patent: 5582866 (1996-12-01), White
patent: 5619051 (1997-04-01), Endo
patent: 5726087 (1998-03-01), Tseng et al.
patent: 5763922 (1998-06-01), Chau
patent: 5834343 (1998-11-01), Ogasawara et al.
patent: 5840626 (1998-11-01), Ohguro
patent: 5851602 (1998-12-01), Law et al.
patent: 5861197 (1999-01-01), Law et al.
patent: 5865896 (1999-02-01), Nowak et al.
patent: 5874766 (1999-02-01), Hori
patent: 5880508 (1999-03-01), Wu
patent: 5891798 (1999-04-01), Doyle et al.
patent: 5916365 (1999-06-01), Sherman
patent: 5928732 (1999-07-01), Law et al.
patent: 5935373 (1999-08-01), Koshimizu
patent: 5937303 (1999-08-01), Gardner et al.
patent: 5960270 (1999-09-01), Misra et al.
patent: 5976993 (1999-11-01), Ravi et al.
patent: 6008095 (1999-12-01), Gardner et al.
patent: 6013553 (2000-01-01), Wallace et al.
patent: 6020024 (2000-02-01), Maiti et al.
patent: 6020243 (2000-02-01), Wallace et al.
patent: 6023613 (2000-02-01), Kanehara
patent: 6027961 (2000-02-01), Maiti et al.
patent: 6033963 (2000-03-01), Huang et al.
patent: 6041734 (2000-03-01), Raoux et al.
patent: 6043157 (2000-03-01), Gardner et al.
patent: 6049114 (2000-04-01), Maiti et al.
patent: 6054013 (2000-04-01), Collins et al.
patent: 6060755 (2000-05-01), Ma et al.
patent: 6063704 (2000-05-01), Demirlioglu
patent: 6066533 (2000-05-01), Yu
patent: 6077403 (2000-06-01), Kobayashi et al.
patent: 6082375 (2000-07-01), Gealy et al.
patent: 6083836 (2000-07-01), Rodder
patent: 6087231 (2000-07-01), Xiang et al.
patent: 6090653 (2000-07-01), Wu
patent: 6093590 (2000-07-01), Lou
patent: 6110287 (2000-08-01), Arai et al.
patent: 6117279 (2000-09-01), Smolanoff et al.
patent: 6130123 (2000-10-01), Liang et al.
patent: 6136654 (2000-10-01), Kraft et al.
patent: 6140024 (2000-10-01), Misium et al.
patent: 6140688 (2000-10-01), Gardner et al.
patent: 6162709 (2000-12-01), Raoux et al.
patent: 6171900 (2001-01-01), Sun
patent: 6171910 (2001-01-01), Hobbs et al.
patent: 6174809 (2001-01-01), Kang et al.
patent: 6184072 (2001-02-01), Kaushik et al.
patent: 6184114 (2001-02-01), Lukanc
patent: 6190513 (2001-02-01), Forster et al.
patent: 6200893 (2001-03-01), Sneh
patent: 6203613 (2001-03-01), Gates et al.
patent: 6207304 (2001-03-01), Law et al.
patent: 6207487 (2001-03-01), Kim et al.
patent: 6228229 (2001-05-01), Raaijmakers et al.
patent: 6235650 (2001-05-01), Yao
patent: 6238734 (2001-05-01), Senzaki et al.
patent: 6244211 (2001-06-01), Nishikawa et al.
patent: 6254738 (2001-07-01), Stimson et al.
patent: 6254746 (2001-07-01), Subramani et al.
patent: 6255231 (2001-07-01), Chen et al.
patent: 6255698 (2001-07-01), Gardner et al.
patent: 6258675 (2001-07-01), Gardner et al.
patent: 6264812 (2001-07-01), Raaijmakers et al.
patent: 6270572 (2001-08-01), Kim et al.
patent: 6277253 (2001-08-01), Narasimhan et al.
patent: 6287635 (2001-09-01), Cook et al.
patent: 6287965 (2001-09-01), Kang et al.
patent: 6291282 (2001-09-01), Wilk et al.
patent: 6291283 (2001-09-01), Wilk
patent: 6297107 (2001-10-01), Paton et al.
patent: 6297539 (2001-10-01), Ma et al.
patent: 6297595 (2001-10-01), Stimson et al.
patent: 6299294 (2001-10-01), Regan
patent: 6303481 (2001-10-01), Park
patent: 6305314 (2001-10-01), Sneh et al.
patent: 6306216 (2001-10-01), Kim et al.
patent: 6320238 (2001-11-01), Kizilyalli et al.
patent: 6342277 (2002-01-01), Sherman
patent: 6344419 (2002-02-01), Forster et al.
patent: 6345588 (2002-02-01), Stimson
patent: 6346465 (2002-02-01), Miura et al.
patent: 6348126 (2002-02-01), Hanawa et al.
patent: 6348386 (2002-02-01), Gilmer
patent: 6352594 (2002-03-01), Cook et al.
patent: 6354593 (2002-03-01), Frommer et al.
patent: 6355108 (2002-03-01), Won et al.
patent: 6358810 (2002-03-01), Dornfest et al.
patent: 6361667 (2002-03-01), Kobayashi et al.
patent: 6365450 (2002-04-01), Kim
patent: 6365518 (2002-04-01), Lee et al.
patent: 6372598 (2002-04-01), Kang et al.
patent: 6373111 (2002-04-01), Zheng et al.
patent: 6376807 (2002-04-01), Hong et al.
patent: 6391785 (2002-05-01), Satta et al.
patent: 6391803 (2002-05-01), Kim et al.
patent: 6395650 (2002-05-01), Callegari et al.
patent: 6395690 (2002-05-01), Tsaur
patent: 6399491 (2002-06-01), Jeon et al.
patent: 6399520 (2002-06-01), Kawakami et al.
patent: 6413382 (2002-07-01), Wang et al.
patent: 6416577 (2002-07-01), Suntoloa et al.
patent: 6420279 (2002-07-01), Ono et al.
patent: 6436801 (2002-08-01), Wilk et al.
patent: 6444099 (2002-09-01), Sasaki et al.
patent: 6444592 (2002-09-01), Ballantine et al.
patent: 6447636 (2002-09-01), Qian et al.
patent: 6448166 (2002-09-01), Cho et al.
patent: 6451119 (2002-09-01), Sneh et al.
patent: 6451695 (2002-09-01), Sneh
patent: 6452229 (2002-09-01), Krivokapic
patent: 6461483 (2002-10-01), Gopalraja et al.
patent: 6472337 (2002-10-01), Zhuang et al.
patent: 6475276 (2002-11-01), Elers et al.
patent: 6475854 (2002-11-01), Narwankar et al.
patent: 6475908 (2002-11-01), Lin et al.
patent: 6475910 (2002-11-01), Sneh
patent: 6477980 (2002-11-01), White et al.
patent: 6482262 (2002-11-01), Elers et al.
patent: 6482752 (2002-11-01), Yamazaki et al.
patent: 6486080 (2002-11-01), Chooi et al.
patent: 6497796 (2002-12-01), Ashtiani et al.
patent: 6500742 (2002-12-01), Chern et al.
patent: 6504214 (2003-01-01), Yu et al.
patent: 6506287 (2003-01-01), Ding
patent: 6506676 (2003-01-01), Park et al.
patent: 6511875 (2003-01-01), Park et al.
patent: 6514828 (2003-02-01), Ahn et al.
patent: 6524967 (2003-02-01), Alluri
patent: 6528856 (2003-03-01), Bai et al.
patent: 6528858 (2003-03-01), Yu et al.
patent: 6541079 (2003-04-01), Bojarczuk, Jr. et al.
patent: 6544906 (2003-04-01), Rotondaro et al.
patent: 6548366 (2003-04-01), Niimi et al.
patent: 6548368 (2003-04-01), Narwankar et al.
patent: 6551446 (2003-04-01), Hanawa et al.
patent: 6554979 (2003-04-01), Stimson
patent: 6599572 (2003-07-01), Saanila et al.
patent: 6610374 (2003-08-01), Tsai et al.
patent: 6610615 (2003-08-01), McFadden et al.
patent: 6617209 (2003-09-01), Chau et al.
patent: 6617266 (2003-09-01), Ni
Athreya Shankarram A.
Gopal Vidyut
Han Shixue
Kher Shreyas S.
Metzner Craig R.
Applied Materials Inc.
Kebede Brook
Patterson & Sheridan LLP
LandOfFree
ALD metal oxide deposition process using direct oxidation does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with ALD metal oxide deposition process using direct oxidation, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and ALD metal oxide deposition process using direct oxidation will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4089936