Adhesion of tungsten nitride films to a silicon surface

Details Adhesion of tungsten nitride films to a silicon surface Adhesion of tungsten nitride films to a silicon surface

2006-05-04

2009-06-23

Estrada, Michelle (Department: 2823)

Active solid-state devices (e.g., transistors, solid-state diode

Combined with electrical contact or lead

Of specified material other than unalloyed aluminum

C257S758000, C257S764000, C257S770000, C257SE23118, C257SE21292

Reexamination Certificate

active

07550851

ABSTRACT:
A process is described that forms a low resistivity connection between a tungsten layer and a silicon surface with high adherence of the tungsten to the silicon. The silicon surface is plasma-cleaned to remove native oxide. A very thin layer (one or more monolayers) of Si-NH2is formed on the silicon surface, serving as an adhesion layer. A WNxlayer is formed over the Si-NH2layer, using an atomic layer deposition (ALD) process, to serve as a barrier layer. A thick tungsten layer is formed over the WNxlayer by CVD. An additional metal layer (e.g., aluminum) may be formed over the tungsten layer.

REFERENCES:
patent: 5366929 (1994-11-01), Cleeves et al.
patent: 6559050 (2003-05-01), McKee et al.
patent: 7229918 (2007-06-01), Moon
patent: 7344896 (2008-03-01), Leuschner et al.
patent: 2001/0007797 (2001-07-01), Jang et al.
patent: 2003/0020180 (2003-01-01), Ahn et al.
patent: 2003/0224217 (2003-12-01), Byun et al.
patent: 2004/0115929 (2004-06-01), Lim
patent: 2004/0142557 (2004-07-01), Levy et al.
patent: 2005/0170642 (2005-08-01), Hineman et al.
patent: 2006/0048702 (2006-03-01), Son et al.
patent: 2006/0057804 (2006-03-01), Saito et al.
patent: 2006/0094238 (2006-05-01), Levy et al.
patent: 2006/0183327 (2006-08-01), Moon
Ghandi, Sorab, “VLSI Fabrication Principles,” 1983, John Wiley & Sons, Inc., pp. 517-520.

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