Active hardmask for lithographic patterning

Details Active hardmask for lithographic patterning Active hardmask for lithographic patterning

2006-04-25

2006-04-25

Duda, Kathleen (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C430S395000

Reexamination Certificate

active

07033739

ABSTRACT:
In an implementation, energy reaching the lower surface of a photoresist may be redirected back into the photoresist material. This may be done by, for example, reflecting and/or fluorescing the energy from a hardmask provided on the wafer surface back into the photoresist.

REFERENCES:
patent: 6830850 (2004-12-01), Krivokapic et al.

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