Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1995-06-06
1997-03-11
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
G03F 7039
Patent
active
056099894
ABSTRACT:
Proton sponge, berberine, and cetyltrimethyl ammonium hydroxide base compounds are used as additives to chemically amplified photoresists based on modified polyhydroxystyrene (PHS). The base additives scavenge free acids from the photoresist in order to preserve the acid labile moieties on the modified PHS polymer. The base additives are well suited to industrial processing conditions, do not react with the photoacid compounds in the photoresist composition to form byproducts which would hinder photoresist performance, and extend the shelf-life of the photoresist composition. In addition, the proton sponge and berberine base additives have a different absorption spectra than the modified PHS polymer, therefore, the quantity of base additive within the photoresist can be easily assayed and controlled.
REFERENCES:
patent: 4600683 (1986-07-01), Greco et al.
patent: 4612270 (1986-09-01), Pampalone et al.
patent: 4744834 (1988-05-01), Haq
patent: 4963463 (1990-10-01), Koshiba et al.
patent: 5210000 (1993-05-01), Thackeray et al.
patent: 5252435 (1993-10-01), Tani et al.
patent: 5258257 (1993-11-01), Sinta et al.
patent: 5320931 (1994-06-01), Umehara et al.
patent: 5352564 (1994-10-01), Takeda et al.
patent: 5376498 (1994-12-01), Kajita et al.
patent: 5525453 (1996-06-01), Pryzbilla et al.
Terrier et al, J Org Chem 1986 51, 409-411.
Bantu Nageshwer R.
Brunsvold William R.
Hefferon George J.
Huang Wu-Song
Katnani Ahmad D.
Hamilton Cynthia
International Business Machines - Corporation
Soucar Steven J.
LandOfFree
Acid scavengers for use in chemically amplified photoresists does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Acid scavengers for use in chemically amplified photoresists, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Acid scavengers for use in chemically amplified photoresists will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-442191