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Passivation for cleaning a material

Semiconductor device manufacturing: process – Chemical etching – Altering etchability of substrate region by compositional or...
Reexamination Certificate

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Plasma etch method for forming residue free fluorine containing

Semiconductor device manufacturing: process – Chemical etching – Altering etchability of substrate region by compositional or...
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Plasma etch process for nonhomogenous film

Semiconductor device manufacturing: process – Chemical etching – Altering etchability of substrate region by compositional or...
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Plasma treatment method to reduce silicon erosion over HDI...

Semiconductor device manufacturing: process – Chemical etching – Altering etchability of substrate region by compositional or...
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Process for improving the etch stability of ultra-thin...

Semiconductor device manufacturing: process – Chemical etching – Altering etchability of substrate region by compositional or...
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Process for the definition of openings in a dielectric layer

Semiconductor device manufacturing: process – Chemical etching – Altering etchability of substrate region by compositional or...
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Process to reduce substrate effects by forming channels...

Semiconductor device manufacturing: process – Chemical etching – Altering etchability of substrate region by compositional or...
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