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Polymers and photoresist compositions for short wavelength imagi

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
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Polymers and photoresist compositions for short wavelength...

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Polymers and photoresist compositions for short wavelength...

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Polymers and photoresist compositions for short wavelength...

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Polymers and photoresist compositions using the same

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Polymers and use thereof

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Polymers based on cinnamic acid as a bottom antireflective...

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Polymers based on cinnamic acid as a bottom antireflective...

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Polymers blends and their use in photoresist compositions...

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Polymers chemically amplified positive resist compositions, and

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Polymers containing oxygen and sulfur alicyclic units and...

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Polymers containing oxygen and sulfur alicyclic units and...

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Polymers containing oxygen and sulfur alicyclic units and...

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Polymers containing protected styrene and unprotected hydroxbenz

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Polymers for aqueous processed photoresists

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Polymers for photoresist compositions for microlithography

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Polymers having N,N-disubstituted sulfonamide pendent groups and

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Polymers with mixed photoacid-labile groups and photoresists...

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Polymers, chemical amplification resist compositions and...

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Polymers, chemical amplification resist compositions and...

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