4. Etching a substrate: processes
  5. Masking of a substrate using material resistant to an etchant
  6. Mechanically forming pattern into a resist
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Positive tone bi-layer imprint lithography method

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mechanically forming pattern into a resist
Reexamination Certificate

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Positive tone bi-layer imprint lithography method

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mechanically forming pattern into a resist
Reexamination Certificate

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Processing apparatus and method

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mechanically forming pattern into a resist
Reexamination Certificate

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Processing method

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mechanically forming pattern into a resist
Reexamination Certificate

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