4. Etching a substrate: processes
  5. Masking of a substrate using material resistant to an etchant
  6. Mask is reusable
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Electron beam writing method and apparatus for carrying out the

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is reusable
Patent

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Etching method and apparatus

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is reusable
Patent

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Method and apparatus for retaining an internal coating...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is reusable
Reexamination Certificate

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