Method and apparatus for reducing contamination of a substrate i

Details Method and apparatus for reducing contamination of a substrate i Method and apparatus for reducing contamination of a substrate i

1998-07-21

2000-08-01

Lund, Jeffrie R

Coating apparatus

Gas or vapor deposition

Work support

118715, 118725, 118728, 118730, C23C 1600

Patent

active

06096135&

ABSTRACT:
Method and apparatus for reducing contamination of a substrate in a substrate processing system. The apparatus has a substrate support, a gas directing shield circumscribing the substrate support and a shadow ring disposed vertically above the substrate support and gas directing shield for retaining the substrate. The gas directing shield and substrate support define an annular channel that is provided with an edge purge gas. The edge purge gas imparts a force at the edge of a substrate resting on the substrate support the lifts it off the substrate supports and against the shadow ring. The shadow ring further has a plurality of conduits extending from its upper surface to its sidewall to provide a path for the edge purge gas to vent and to impede the flow of process gases under the backside and around the edge of the substrate. The method includes the steps of providing a substrate upon the substrate support, applying a first flow of gas to a first set of ports to lift the substrate off of the substrate support, centering the substrate upon the substrate support and applying a second flow of gas to a second set of ports to establish and maintain thermal control of the substrate.

REFERENCES:
patent: 5213650 (1993-05-01), Wang et al.
patent: 5292554 (1994-03-01), Sinha et al.
patent: 5328722 (1994-07-01), Ghanayem et al.
patent: 5370709 (1994-12-01), Kobayashi
patent: 5516367 (1996-05-01), Lei et al.
patent: 5578532 (1996-11-01), van de Ven et al.
patent: 5583736 (1996-12-01), Anderson et al.
patent: 5620525 (1997-04-01), van de Ven et al.
patent: 5697427 (1997-12-01), Ngan et al.
patent: 5766365 (1998-06-01), Umotoy et al.
patent: 5769951 (1998-06-01), Van De Ven et al.
patent: 5810931 (1998-09-01), Stevens et al.
patent: 5843233 (1998-12-01), van de Ven et al.
patent: 5855687 (1999-01-01), Dubois et al.
patent: 5882417 (1999-03-01), van de Ven et al.
patent: 5886864 (1999-03-01), Dvorsky
patent: 5888304 (1999-03-01), Umotoy et al.

Affiliated with

Also associated with

Rating

Method and apparatus for reducing contamination of a substrate i does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for reducing contamination of a substrate i, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for reducing contamination of a substrate i will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-660039