Immersion photolithography with megasonic rinse

Details Immersion photolithography with megasonic rinse Immersion photolithography with megasonic rinse

2004-11-23

2010-06-08

Duda, Kathleen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

Reexamination Certificate

active

07732123

ABSTRACT:
A method comprises forming a photoresist on a substrate, rinsing the photoresist using a rinse liquid agitated with at least one megasonic source, exposing the photoresist to radiation while immersed in a liquid, and developing the photoresist.

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