Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – Having glow discharge electrode gas energizing means
Reexamination Certificate
2006-09-29
2010-06-22
Kackar, Ram N (Department: 1792)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
Having glow discharge electrode gas energizing means
C156S345100, C118S624000, C118S728000
Reexamination Certificate
active
07740736
ABSTRACT:
Techniques and apparatus for substantially reducing and/or preventing the occurrence of plasma un-confinement events, including one or more of shielding a gap disposed between chamber components and along a RF current path with a dielectric shielding structure, shielding a sharp component structure with a dielectric shielding structure, and keeping the gap between adjacent pairs of plasma confinement rings smaller than the worst-case DeBye length for the plasma.
REFERENCES:
patent: 6165910 (2000-12-01), Flanner et al.
patent: 6432261 (2002-08-01), Watanabe et al.
patent: 6485604 (2002-11-01), Okayama et al.
patent: 6506687 (2003-01-01), Izawa et al.
patent: 6554949 (2003-04-01), De et al.
patent: 6723202 (2004-04-01), Nagaiwa et al.
patent: 6899786 (2005-05-01), Senzaki et al.
patent: 2004/0129226 (2004-07-01), Strang et al.
patent: 2005/0039682 (2005-02-01), Dhindsa et al.
patent: 2005/0099135 (2005-05-01), Landis et al.
patent: 2005/0103442 (2005-05-01), Chen et al.
patent: 2005/0145336 (2005-07-01), Matsushima et al.
“Written Opinion”, Issue in PCT Application No. PCT/US2007/70758; Mailng Date.: Apr. 28, 2008.
“International Search Report”, Issue in PCT Application No. PCT/US2007/70758; Mailing Date.: Apr. 28, 2008.
“International Preliminary Report on Patentability”, Issued in PCT Application No. PCT/US2007/070758; Mailing Date: Dec. 24, 2008.
Dhindsa Rajinder
Fischer Andreas
Chen Keath T
IP Strategy Group, P.C.
Kackar Ram N
Lam Research Corporation
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