Method and apparatus for selectively altering dielectric...

Details Method and apparatus for selectively altering dielectric... Method and apparatus for selectively altering dielectric...

2006-05-16

2006-05-16

Sarkar, Asok Kumar (Department: 2891)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

Reexamination Certificate

active

07045472

ABSTRACT:
A method for selectively altering dielectric properties of a semi-conductor device. In an exemplary embodiment, the method includes applying energy to a local region of interest, the local region of interest including a thermally alterable dielectric such that said heating caused by the applied energy causes a dielectric constant of the thermally alterable dielectric to change.

REFERENCES:
patent: 5084299 (1992-01-01), Hirsch et al.
patent: 5087589 (1992-02-01), Chapman et al.
patent: 5387114 (1995-02-01), Brunker et al.
patent: 5391516 (1995-02-01), Wojnarowski et al.
patent: 6060895 (2000-05-01), Soh et al.
patent: 6288905 (2001-09-01), Chung
patent: 6519753 (2003-02-01), Ang et al.
patent: 6685983 (2004-02-01), Hawker et al.
patent: 2004/0052948 (2004-03-01), Gronbeck et al.

Affiliated with

Also associated with

Rating

Method and apparatus for selectively altering dielectric... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for selectively altering dielectric..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for selectively altering dielectric... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3550639