Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

2005-02-01

2005-02-01

Lee, Wilson (Department: 2821)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

C118S7230IR, C118S7230ER

Reexamination Certificate

active

06850012

ABSTRACT:
Induction coils of an induction coupling type plasma processing apparatus are divided into a plurality of coil elements and a plurality of lead wire portions for effecting connection between the coil elements. The coil elements are disposed inside of a process chamber, while the lead wire portions which effect connection between the coil elements are disposed outside of the process chamber. The coil elements disposed in the process chamber are in the form of short arcs as a result of the division thereof, so that they can be easily arranged symmetrically with respect to the center of the process chamber, whereby a uniform plasma distribution can be easily achieved.

REFERENCES:
patent: 6197165 (2001-03-01), Drewery et al.
patent: 6273022 (2001-08-01), Pu et al.
patent: 6534922 (2003-03-01), Bhardwaj et al.
patent: 2-235332 (1990-09-01), None
patent: 7-106095 (1995-04-01), None

Affiliated with

Also associated with

Rating

Plasma processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma processing apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3512331