Method of in situ monitoring of supercritical fluid process...

Details Method of in situ monitoring of supercritical fluid process... Method of in situ monitoring of supercritical fluid process...

2005-08-09

2005-08-09

Porta, David (Department: 2878)

Radiant energy

Invisible radiant energy responsive electric signalling

Infrared responsive

C250S339120, C250S339060, C250S339010, C250S338100, C250S336100

Reexamination Certificate

active

06927393

ABSTRACT:
A method and apparatus are provided for in situ monitoring and analyzing of process parameters for semiconductor fabrication processes including cleaning semiconductor wafers utilizing a supercritical fluid or a high pressure liquid such as CO2. The method and apparatus utilize a spectrometer having a reflective mirror proximate the vessel holding the high pressure fluid. NIR radiation transmitted into the vessel through a window and out of the vessel through an opposed window is reflected and detected and measured and the composition of the fluid in the pressure vessel is determined allowing the user to control process parameters based on the measured composition.

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