Plasma processor apparatus and method, and antenna

Details Plasma processor apparatus and method, and antenna Plasma processor apparatus and method, and antenna

2005-04-05

2005-04-05

Phan, Tho (Department: 2821)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

C315S111210, C118S7230IR, C118S7230IR

Reexamination Certificate

active

06876155

ABSTRACT:
An antenna includes excitation terminals responsive to an RF source to supply an RF electromagnetic field to a plasma that processes a workpiece in a vacuum chamber. A matching network includes first and second portions respectively between the source and terminals and between the terminals and the antenna plasma excitation coil. In response to indications of impedance matching between the source and its load, currents flowing between (1) the first portion and the terminals and (2) the terminals and the coil are controlled so the latter exceeds the former. The indications control impedances of the first and second portions or the first portion impedance and the source frequency. The coil can include a transformer having a primary winding coupled to the excitation terminals and a multi-turn plasma excitation secondary winding.

REFERENCES:
patent: 5759280 (1998-06-01), Holland et al.
patent: 5800619 (1998-09-01), Holland et al.
patent: 6441555 (2002-08-01), Howald et al.
patent: 6531029 (2003-03-01), Ni et al.
patent: 6583572 (2003-06-01), Veltrop et al.
patent: 6741446 (2004-05-01), Ennis

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